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030916t19931993maua sb 001 0 eng d |
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|a 1591245257 (electronic bk.)
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|a (OCoLC)53032668
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|a (OCoLC)ocm53032668
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|a KNOVL
|c KNOVL
|d WEN
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|a WENN
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|a QC611.8.S5
|b C48 1993eb
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245 |
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|a Characterization in silicon processing
|h [electronic resource] /
|c editor, Yale Strusser ; consulting editors, C.R. Brundle, Gary E. McGuire ; managing editor, Lee E. Fitzpatrick.
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264 |
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1 |
|a Boston :
|b Butterworth-Heinemann ;
|a Greenwich :
|b Manning,
|c [1993]
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264 |
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4 |
|c ©1993
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300 |
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|a xiii, 240 pages :
|b illustrations ;
|c 25 cm.
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336 |
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|a text
|b txt
|2 rdacontent
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337 |
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|a computer
|b c
|2 rdamedia
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338 |
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|a online resource
|b cr
|2 rdacarrier
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490 |
1 |
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|a Materials characterization series
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504 |
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|a Includes bibliographical references and index.
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533 |
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|a Electronic reproduction.
|b Norwich, N.Y. :
|c Knovel,
|d 2003.
|n System requirements: Adobe Acrobat Reader.
|n Available via the World Wide Web.
|n Access restricted to users at licensed institutions.
|n Includes interactive index.
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650 |
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|a Silicon.
|0 sh 85122512
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650 |
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|a Electric conductors.
|0 sh 85041622
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650 |
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|a Semiconductor films.
|0 sh 85119892
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650 |
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|a Surface chemistry.
|0 sh 85130718
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700 |
1 |
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|a Strausser, Yale.
|0 n 93044462
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710 |
2 |
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|a Knovel (Firm)
|0 nr2001027264
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776 |
1 |
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|c Original
|z 0750691727
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|a Materials characterization series.
|0 n 92039072
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|t 0
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952 |
f |
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|a Wentworth Institute of Technology
|b Main Campus
|c Wentworth Library
|d Ebooks
|t 0
|e Knovel
|h Other scheme
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856 |
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|u https://ezproxywit.flo.org/login?qurl=https://app.knovel.com/hotlink/toc/id:kpCSP00001/characterization-in-silicon
|y Full text (Wentworth users only)
|