Handbook of thin film process technology /
"The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and...
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Other Authors: | , |
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Format: | Electronic eBook |
Language: | English |
Published: |
Boca Raton, FL :
CRC Press,
2018.
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Edition: | First edition. |
Subjects: | |
Online Access: |
Full text (WIT users only) |
MARC
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020 | |a 9781351098137 |q (e-book: Mobi) | ||
020 | |z 9781315893686 |q (hardback) | ||
024 | 7 | |a 10.1201/9781351072793 |2 doi | |
035 | |a (OCoLC)1019716988 | ||
035 | |a 9781351072793 | ||
049 | |a WENN | ||
050 | 4 | |a TA418.9.T45 |b H36 2018 | |
082 | 0 | 4 | |a 621.38152 |b H236 |
245 | 0 | 0 | |a Handbook of thin film process technology / |c editors, David A. Glocker, Isoflux Inc., NY, USA, S. Ismat Shah, E.I. du Pont de Nemours & Co., Wilmington, DE, USA. |
250 | |a First edition. | ||
264 | 1 | |a Boca Raton, FL : |b CRC Press, |c 2018. | |
300 | |a 1 online resource (1 volume pages) | ||
336 | |a text |b txt |2 rdacontent | ||
337 | |a computer |b c |2 rdamedia | ||
338 | |a online resource |b cr |2 rdacarrier | ||
505 | 0 | |t chapter A Physical Deposition Techniques / |r Glocker David A -- |t chapter A5.0 Reactive Sputtering: Introduction and General Discussion / |r William D Westwood -- |t chapter A5.1 Reactive Pulsed DC Magnetron Sputtering and Control / |r Jochen M Schneider -- |t chapter A5.2 AC and RF Reactive Sputtering / |r Grant O Este -- |t chapter A5.3 Modeling of the Reactive Sputtering Process / |r S Berg. | |
520 | |a "The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques."--Provided by publisher. | ||
650 | 0 | |a Surfaces (Technology) |v Handbooks, manuals, etc. |0 sh 85130750 | |
650 | 0 | |a Thin films |v Handbooks, manuals, etc. |0 sh 85134864 | |
700 | 1 | |a Glocker, D. A., |e editor. | |
700 | 1 | |a Shah, S. I., |e editor. | |
730 | 0 | |a 98/1 reactive sputtering. | |
776 | 0 | 8 | |i Print version: |z 9781315893686 |
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856 | 4 | 0 | |t 0 |u https://ezproxywit.flo.org/login?qurl=https://www.taylorfrancis.com/books/9781351072793 |y Full text (WIT users only) |