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|a 9781420026580 (e-book : PDF)
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|a Silicon heterostructure handbook
|h [electronic resource] :
|b materials, fabrication, devices, circuits, and applications of SiGe and Si strained-layer epitaxy /
|c edited byJohn D. Cressler.
|
| 264 |
|
1 |
|a Boca Raton, FL :
|b CRC Taylor & Francis,
|c 2006.
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| 300 |
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|a 1,248 pages :
|b illustrations
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| 336 |
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|a text
|b txt
|2 rdacontent
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|a computer
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|2 rdamedia
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|a online resource
|b cr
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|a Includes bibliographical references and index.
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| 538 |
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|a Mode of access: World Wide Web.
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|u https://ezproxywit.flo.org/login?qurl=https://marc.crcnetbase.com/ISBN/9781420026580
|y Full text (Wentworth users only)
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Wentworth
Institute of Technology